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Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS
Publication:
Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS
Date
2000
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conard, Thierry
;
De Witte, Hilde
;
Vandervorst, Wilfried
;
Houssa, Michel
;
Heyns, Marc
;
Pomarede, C.
;
Werkhoven, Chris
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1847
since deposited on 2021-10-14
419
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Acq. date: 2025-10-24
Citations
Metrics
Views
1847
since deposited on 2021-10-14
419
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations