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Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS

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1850 since deposited on 2021-10-14
3last month
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Acq. date: 2025-12-11

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1850 since deposited on 2021-10-14
3last month
1last week
Acq. date: 2025-12-11

Citations