Publication:

Defectivity modulation in EUV resists through advanced filtration technologies

Date

2020
Proceedings Paper
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dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorUmeda, T.
dc.contributor.authorMizuno, T.
dc.contributor.authorHattori, A.
dc.contributor.authorVaranasi, R.
dc.contributor.authorSingh, A.
dc.contributor.authorBeera, R.
dc.contributor.authorFoubert, Philippe
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorDrent, Waut
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorDrent, Waut
dc.date.accessioned2021-10-28T21:28:06Z
dc.date.available2021-10-28T21:28:06Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35080
dc.identifier.urlhttps://doi.org/10.1117/12.2560144
dc.source.beginpage113260K
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.title

Defectivity modulation in EUV resists through advanced filtration technologies

dc.typeProceedings paper
dspace.entity.typePublication
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