Publication:

Metrology for implanted Si substrate and dopant loss studies

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorRadisic, Dunja
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorRosseel, Erik
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMarrant, Koen
dc.contributor.authorBender, Hugo
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned2021-10-18T02:03:26Z
dc.date.available2021-10-18T02:03:26Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16073
dc.source.beginpage367
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage374
dc.title

Metrology for implanted Si substrate and dopant loss studies

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
18664.pdf
Size:
404.02 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions