Publication:

Accurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulations

Date

2016
Proceedings Paper
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dc.contributor.authorEyben, Pierre
dc.contributor.authorMatagne, Philippe
dc.contributor.authorChiarella, Thomas
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorKubicek, Stefan
dc.contributor.authorMitard, Jerome
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.contributor.authorMocuta, Dan
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecEyben, Pierre::0000-0003-3686-556X
dc.date.accessioned2021-10-23T10:46:55Z
dc.date.available2021-10-23T10:46:55Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26607
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7605203
dc.source.beginpage287
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate6/09/2016
dc.source.conferencelocationNürnberg Germany
dc.source.endpage290
dc.title

Accurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulations

dc.typeProceedings paper
dspace.entity.typePublication
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