Publication:

Sidewall grooving on CoSi2 narrow lines

Date

2003
Proceedings Paper
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dc.contributor.authorChamirian, Oxana
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLauwers, Anne
dc.contributor.authorRichard, Olivier
dc.contributor.authorLindsay, Richard
dc.contributor.authorVrancken, Christa
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T04:07:28Z
dc.date.available2021-10-15T04:07:28Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7300
dc.source.beginpage155
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-based CMOS devices
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
dc.source.endpage160
dc.title

Sidewall grooving on CoSi2 narrow lines

dc.typeProceedings paper
dspace.entity.typePublication
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