Publication:
Characterization of annealing and dopant activation processes using Differential Hall Effect Metrology (DHEM)
Date
| dc.contributor.author | Joshi, Abhijeet | |
| dc.contributor.author | Rengo, Gianluca | |
| dc.contributor.author | Porret, Clément | |
| dc.contributor.author | Lin, Kun-Lin | |
| dc.contributor.author | Chang, C-H. | |
| dc.contributor.author | Basol, Bulent | |
| dc.contributor.imecauthor | Rengo, Gianluca | |
| dc.contributor.imecauthor | Porret, Clément | |
| dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
| dc.date.accessioned | 2021-10-31T09:05:03Z | |
| dc.date.available | 2021-10-31T09:05:03Z | |
| dc.date.issued | 2021 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/36823 | |
| dc.identifier.url | https://doi.org/10.1149/10202.0113ecst | |
| dc.source.beginpage | 113 | |
| dc.source.conference | Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11 | |
| dc.source.conferencedate | 30/05/2021 | |
| dc.source.conferencelocation | Chicago, IL USA | |
| dc.title | Characterization of annealing and dopant activation processes using Differential Hall Effect Metrology (DHEM) | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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