Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
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Acq. date: 2026-09-03
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489 since deposited on 2024-08-05
39last month
10last week
Acq. date: 2026-09-03
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632 since deposited on 2024-08-05
Acq. date: 2026-09-03
Citations