Publication:

Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms

Date

2024
Journal article
https://doi.org/10.3390/nano14141212
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dc.contributor.authorLodha, Jayant Kumar
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorPasquali, Mattia
dc.contributor.authorBillington, Hans
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorLodha, Jayant Kumar
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorPasquali, Mattia
dc.contributor.imecauthorBillington, Hans
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLodha, Jayant Kumar::0000-0001-8486-6458
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecPasquali, Mattia::0000-0002-1309-1082
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2024-09-12T08:31:35Z
dc.date.available2024-08-05T18:18:30Z
dc.date.available2024-09-12T08:31:35Z
dc.date.embargo2024-07-16
dc.date.issued2024
dc.description.wosFundingTextThe authors acknowledge Mikhail Krishtab, Marleen V. Veen and imec's p-line for support in providing patterned wafers, Shreya Kundu and Souvik Kundu for support with etch, Olivier Richard and Jef Geypen for their help with TEM, EDS measurements, and Inge Manders for her help with the SEM measurements.
dc.identifier.doi10.3390/nano14141212
dc.identifier.issn2079-4991
dc.identifier.pmidMEDLINE:39057888
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44272
dc.publisherMDPI
dc.source.beginpageArt. 1212
dc.source.endpageN/A
dc.source.issue14
dc.source.journalNANOMATERIALS
dc.source.numberofpages17
dc.source.volume14
dc.subject.keywordsSELF-ASSEMBLED MONOLAYERS
dc.subject.keywordsRUTHENIUM THIN-FILMS
dc.subject.keywordsBOTTOM-UP
dc.subject.keywordsINHIBITOR
dc.subject.keywordsIMPACT
dc.subject.keywordsGROWTH
dc.title

Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms

dc.typeJournal article
dspace.entity.typePublication
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