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Articles
Reliable via-middle copper through-silicon via technology for 3-D integration
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Reliable via-middle copper through-silicon via technology for 3-D integration
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Date
2016
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43650.pdf
3.31 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Beyne, Eric
Journal
IEEE Transactions on Components, Packaging and Manufacturing Technology
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1842
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Acq. date: 2025-12-16
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Views
1842
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-16
Citations