Publication:

Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications

Date

2003

Proceedings Paper

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Files

7262.pdf 392.52 KB

Author(s)

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De Gendt, Stefan

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Van Elshocht, Sven

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Delabie, Annelies

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Carter, Richard

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Conard, Thierry

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Vandervorst, Wilfried

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Schaekers, Marc

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Statistics

2065 since deposited on 2021-10-15

Acq. date: 2026-04-06