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Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Publication:
Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Date
2003
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kaushik, V.
;
De Gendt, Stefan
;
Caymax, Matty
;
Young, E.
;
Röhr, Erika
;
Van Elshocht, Sven
;
Delabie, Annelies
;
Claes, Martine
;
Shi, Xiaoping
;
Chen, Jerry
;
Carter, Richard
;
Conard, Thierry
;
Vandervorst, Wilfried
;
Schaekers, Marc
;
Heyns, Marc
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2061
since deposited on 2021-10-15
Acq. date: 2025-10-22
Citations
Metrics
Views
2061
since deposited on 2021-10-15
Acq. date: 2025-10-22
Citations