Publication:

DUV lithography for 0.35 μm CMOS processing

Date

1995
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGoethals, Mieke
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T13:19:08Z
dc.date.available2021-09-29T13:19:08Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/937
dc.source.beginpage243
dc.source.endpage246
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume27
dc.title

DUV lithography for 0.35 μm CMOS processing

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
912.pdf
Size:
202.96 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles