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Growth and characterization of atomic layer deposited WCxNy
Publication:
Growth and characterization of atomic layer deposited WCxNy
Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Martin Hoyas, Ana
;
Travaly, Youssef
;
Schuhmacher, Jorg
;
Sajavaara, T.
;
Whelan, Caroline
;
Eyckens, Brenda
;
Richard, Olivier
;
Giangrandi, Simone
;
Brijs, Bert
;
Jonas, A.M.
;
Vantomme, A.
;
Vandervorst, Wilfried
;
Celis, Jean-Pierre
;
Maex, Karen
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1952
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1952
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations