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Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Publication:
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Date
2019
Journal article
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44424.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Luong, Vu
;
Philipsen, Vicky
;
Opsomer, Karl
;
Rip, Jens
;
Hendrickx, Eric
;
Heyns, Marc
;
Detavernier, Christophe
;
Laubis, Christian
;
Scholze, Frank
Journal
Journal of Vacuum Science and Technology B
Abstract
Description
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2009
since deposited on 2021-10-27
Acq. date: 2025-10-23
Citations
Metrics
Views
2009
since deposited on 2021-10-27
Acq. date: 2025-10-23
Citations