Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

dc.contributor.author	Luong, Vu
dc.contributor.author	Philipsen, Vicky
dc.contributor.author	Opsomer, Karl
dc.contributor.author	Rip, Jens
dc.contributor.author	Hendrickx, Eric
dc.contributor.author	Heyns, Marc
dc.contributor.author	Detavernier, Christophe
dc.contributor.author	Laubis, Christian
dc.contributor.author	Scholze, Frank
dc.contributor.imecauthor	Luong, Vu
dc.contributor.imecauthor	Philipsen, Vicky
dc.contributor.imecauthor	Opsomer, Karl
dc.contributor.imecauthor	Rip, Jens
dc.contributor.imecauthor	Hendrickx, Eric
dc.contributor.imecauthor	Heyns, Marc
dc.contributor.orcidimec	Philipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned	2021-10-27T13:02:44Z
dc.date.available	2021-10-27T13:02:44Z
dc.date.embargo	9999-12-31
dc.date.issued	2019
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/33484
dc.identifier.url	https://doi.org/10.1116/1.5125662
dc.source.beginpage	61607
dc.source.issue	6
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	37
dc.title	Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
dc.type	Journal article
dspace.entity.type	Publication
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