Publication:

A 50nm high-k poly silicon gate stack with a buried SiGe channel

Date

2007

Proceedings Paper

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Files

15688.pdf 295.04 KB

Author(s)

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Hoffmann, Thomas Y.

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Veloso, Anabela

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de Potter de ten Broeck, Muriel

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Absil, Philippe

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Biesemans, Serge

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Acq. date: 2026-01-26