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Advantages of different source/drain engineering on scaled UTBOX FD SOI nMOSFETs at high temperature operation
Publication:
Advantages of different source/drain engineering on scaled UTBOX FD SOI nMOSFETs at high temperature operation
Date
2014
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nicoletti, Talitha
;
Dos Santos, Sara
;
Martino, Joao A.
;
Aoulaiche, Marc
;
Veloso, Anabela
;
Jurczak, Gosia
;
Simoen, Eddy
;
Claeys, Cor
Journal
Solid-State Electronics
Abstract
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1880
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Acq. date: 2025-12-09
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Metrics
Views
1880
since deposited on 2021-10-22
3
last month
2
last week
Acq. date: 2025-12-09
Citations