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Pupil optimization for after etch defectivity: what imaging metrics matter?
Publication:
Pupil optimization for after etch defectivity: what imaging metrics matter?
Date
2021
Proceedings Paper
https://doi.org/10.1117/12.2600967
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Frommhold, Andreas
;
Franke, Joern-Holger
;
Maslow, Mark J.
;
Nafus, Kathleen
;
Rispens, Gijsbert
Journal
Proceedings of SPIE
Abstract
Description
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302
since deposited on 2021-12-02
Acq. date: 2025-10-24
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1658
since deposited on 2021-12-02
Acq. date: 2025-10-24
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Metrics
Downloads
302
since deposited on 2021-12-02
Acq. date: 2025-10-24
Views
1658
since deposited on 2021-12-02
Acq. date: 2025-10-24
Citations