Publication:

Pupil optimization for after etch defectivity: what imaging metrics matter?

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2600967
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dc.contributor.authorFrommhold, Andreas
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorMaslow, Mark J.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorRispens, Gijsbert
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.date.accessioned2022-06-28T13:21:47Z
dc.date.available2021-12-02T20:45:04Z
dc.date.available2022-06-28T13:21:47Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2600967
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38523
dc.source.beginpage118540H
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedatena
dc.source.conferencelocationOnline only
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.title

Pupil optimization for after etch defectivity: what imaging metrics matter?

dc.typeProceedings paper
dspace.entity.typePublication
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