Publication:

High-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE

Date

2022-07-19
Journal article
https://doi.org/10.1021/acsami.2c07514
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dc.contributor.authorKundu, Shreya
dc.contributor.authorDecoster, Stefan
dc.contributor.authorBezard, Philippe
dc.contributor.authorNalin Mehta, Ankit
dc.contributor.authorDekkers, Harold
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorNalin Mehta, Ankit
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecKundu, Shreya::0000-0001-8052-7774
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecNalin Mehta, Ankit::0000-0002-2169-940X
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.date.accessioned2022-08-26T09:13:19Z
dc.date.available2022-08-05T02:35:40Z
dc.date.available2022-08-19T09:22:58Z
dc.date.available2022-08-26T09:13:19Z
dc.date.embargo9999-12-31
dc.date.issued2022-07-19
dc.description.wosFundingTextThe authors would like to thank Nouredine Rassoul (IMEC) for discussion on the HM strategy and Subhali Subhechha (IMEC) for providing a brief overview of the intended applications of IGZO. We acknowledge the support of IMECs Industrial Affiliation Program and the Active Memory Program. We also acknowledge the support of IMECs pilot line and SEM and MCA team for help with deposition and characterization processes.
dc.identifier.doi10.1021/acsami.2c07514
dc.identifier.issn1944-8244
dc.identifier.pmidMEDLINE:35850517
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40204
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage34029
dc.source.endpage34039
dc.source.issue29
dc.source.journalACS APPLIED MATERIALS & INTERFACES
dc.source.numberofpages11
dc.source.volume14
dc.subject.disciplineMaterials science
dc.subject.keywordsDRY-ETCHING CHARACTERISTICS
dc.subject.keywordsFILM
dc.subject.keywordsAtomic layer etching
dc.subject.keywordsplasma pulsing
dc.subject.keywordschemical etching
dc.subject.keywordsInGaZnO
dc.title

High-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE

dc.typeJournal article
dspace.entity.typePublication
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