Publication:

Epitaxial growth by MOCVD on 200 mm engineered substrates for power devices & ICs beyond 650 V

Date

2019
Meeting abstract
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Author(s)

Fahle, Dirk
;
Zhao, Ming  
;
Geens, Karen  
;
Li, Xiangdong  
;
Wellekens, Dirk  
;
Magnani, Alessandro  
;
Amirifar, Nooshin  
;
Bakeroot, Benoit  
;
You, Shuzhen  
;
Odnoblyudov, Vladimir
;
Aktas, Ozgur
;
Basceri, Cem
;
Marcon, Denis  
;
Groeseneken, Guido  
;
Decoutere, Stefaan  
;
Hahn, Herwig  
;
Heuken, Michael

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Abstract

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