e-beam metrology of thin resist for high NA EUVL

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Author(s)

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De Simone, Danilo

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Dey, Bappaditya

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Goldenshtein, Alex

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Houchens, Kevin

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Santoro, Gaetano

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Fischer, Daniel

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Muellender, Angelika

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Kondo, Tsuyoshi

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Shohjoh, Tomoyasu

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Charley, Anne-Laure

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De Gendt, Stefan

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Leray, Philippe

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

Metrics

1251 since deposited on 2023-05-07

Acq. date: 2025-10-23