Publication:

e-beam metrology of thin resist for high NA EUVL

Date

2023
Journal Article Review
https://doi.org/10.35848/1347-4065/acc3a4
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dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorZidan, Mohamed
dc.contributor.authorSeveri, Joren
dc.contributor.authorMoussa, Alain
dc.contributor.authorDey, Bappaditya
dc.contributor.authorHalder, Sandip
dc.contributor.authorGoldenshtein, Alex
dc.contributor.authorHouchens, Kevin
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorFischer, Daniel
dc.contributor.authorMuellender, Angelika
dc.contributor.authorMack, Chris
dc.contributor.authorKondo, Tsuyoshi
dc.contributor.authorShohjoh, Tomoyasu
dc.contributor.authorIkota, Masami
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.date.accessioned2023-07-10T14:11:45Z
dc.date.available2023-05-07T20:59:45Z
dc.date.available2023-07-10T14:11:45Z
dc.date.embargo9999-12-31
dc.date.issued2023
dc.identifier.doi10.35848/1347-4065/acc3a4
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41574
dc.publisherIOP Publishing Ltd
dc.source.beginpageArt. SG0808
dc.source.endpagena
dc.source.issueSG
dc.source.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.source.numberofpages9
dc.source.volume62
dc.title

e-beam metrology of thin resist for high NA EUVL

dc.typeJournal article review
dspace.entity.typePublication
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