Publication:

Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamber

Date

2002
Presentation
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dc.contributor.authorMannaert, Geert
dc.contributor.authorVan Cauwenberghe, M.
dc.contributor.authorSchmidt, Michael
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStucchi, Michele
dc.contributor.authorConard, Thierry
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-14T22:18:09Z
dc.date.available2021-10-14T22:18:09Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6571
dc.source.conferenceUCPSS - Ultra Clean Processing Technology Symposium
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.title

Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson Highlands chamber

dc.typeOral presentation
dspace.entity.typePublication
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