Publication:

Characterization of ultra-thin PtSi films for infrared detectors

Date

1996
Proceedings Paper
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dc.contributor.authorBender, Hugo
dc.contributor.authorRoussel, Philippe
dc.contributor.authorKolodinski, Sabine
dc.contributor.authorTorres Jacome, Alfonso
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorMaex, Karen
dc.contributor.authorvan der Sluis, P.
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-29T14:16:41Z
dc.date.available2021-09-29T14:16:41Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1077
dc.source.beginpage449
dc.source.conferenceSilicide Thin Films - Fabrication, Properties, and Applications
dc.source.conferencedate27/11/1995
dc.source.conferencelocationBoston, MA USA
dc.source.endpage454
dc.title

Characterization of ultra-thin PtSi films for infrared detectors

dc.typeProceedings paper
dspace.entity.typePublication
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