Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

Groven, Benjamin; Nalin Mehta, Ankit; Bender, Hugo; Smets, Quentin; Meersschaut, Johan; Franquet, Alexis; Conard, Thierry; Nuytten, Thomas; Verdonck, Patrick; Vandervorst, Wilfried; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Delabie, Annelies

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Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

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2018

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Vandervorst, Wilfried

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Journal of Vacuum Science and Technology A

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1899 since deposited on 2021-10-25

Acq. date: 2026-05-16

Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

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