Publication:

Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

Date

2018
Journal article
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dc.contributor.authorGroven, Benjamin
dc.contributor.authorNalin Mehta, Ankit
dc.contributor.authorBender, Hugo
dc.contributor.authorSmets, Quentin
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorNuytten, Thomas
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.authorCaymax, Matty
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorNalin Mehta, Ankit
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecNalin Mehta, Ankit::0000-0002-2169-940X
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-25T19:17:40Z
dc.date.available2021-10-25T19:17:40Z
dc.date.issued2018
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30810
dc.identifier.urlhttp://avs.scitation.org/doi/full/10.1116/1.5003361
dc.source.beginpage01A105
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.volume36
dc.title

Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

dc.typeJournal article
dspace.entity.typePublication
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