Publication:

EUV photoresist patterning characterization for imec N7/N5 technology

Date

2018
Proceedings Paper
https://doi.org/10.1117/12.2299504
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40152.pdf 1.96 MB

Author(s)

De Simone, Danilo  
;
Rutigliani, Vito  
;
Lorusso, Gian  
;
De Bisschop, Peter  
;
Vesters, Yannick
;
Blanco, Victor  
;
Vandenberghe, Geert  

Journal

Proceedings of SPIE; Vol. 10583

Abstract

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