Publication:

EUV photoresist patterning characterization for imec N7/N5 technology

Date

2018
Proceedings Paper
https://doi.org/10.1117/12.2299504
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-3498-5082
cris.virtual.orcid0009-0001-2424-1322
cris.virtual.orcid0000-0002-8297-5076
cris.virtual.orcid0000-0003-4308-0381
cris.virtual.orcid0000-0003-3927-5207
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.department0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7
cris.virtualsource.departmentb4f8c238-ae6a-4a36-b09f-6a93bec3afa5
cris.virtualsource.departmentbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.department88d4cdb2-8ec4-4aa4-87ee-9719850d7416
cris.virtualsource.departmentffad9b55-9af5-4edb-8c86-134820dc8dd9
cris.virtualsource.department5fc73164-72f0-4f1a-a4a8-c759f8c39c67
cris.virtualsource.orcid0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7
cris.virtualsource.orcidb4f8c238-ae6a-4a36-b09f-6a93bec3afa5
cris.virtualsource.orcidbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.orcid88d4cdb2-8ec4-4aa4-87ee-9719850d7416
cris.virtualsource.orcidffad9b55-9af5-4edb-8c86-134820dc8dd9
cris.virtualsource.orcid5fc73164-72f0-4f1a-a4a8-c759f8c39c67
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorRutigliani, Vito
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVesters, Yannick
dc.contributor.authorBlanco, Victor
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-25T17:49:46Z
dc.date.available2021-10-25T17:49:46Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.doi10.1117/12.2299504
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30553
dc.identifier.urlhttps://doi.org/10.1117/12.2299504
dc.publisherSPIE
dc.source.beginpage105830G
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate2018-02-25
dc.source.conferencelocationSan Jose, CA USA
dc.source.journalProceedings of SPIE; Vol. 10583
dc.title

EUV photoresist patterning characterization for imec N7/N5 technology

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
40152.pdf
Size:
1.96 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions