Publication:

EUV photoresist patterning characterization for imec N7/N5 technology

Date

2018
Proceedings Paper
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorRutigliani, Vito
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVesters, Yannick
dc.contributor.authorBlanco, Victor
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-25T17:49:46Z
dc.date.available2021-10-25T17:49:46Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30553
dc.identifier.urlhttps://doi.org/10.1117/12.2299504
dc.source.beginpage105830G
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate26/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

EUV photoresist patterning characterization for imec N7/N5 technology

dc.typeProceedings paper
dspace.entity.typePublication
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