Publication:
In-line and nondestructive analysis of selectively grown epitaxial Si1-xGex and Si/Si1-xGex layers by spectroscopic ellipsometry and comparison with other established techniques
Date
| dc.contributor.author | Loo, Roger | |
| dc.contributor.author | Sleeckx, Erik | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Blavier, G. | |
| dc.contributor.author | Kremer, Stephanie | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.imecauthor | Sleeckx, Erik | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.contributor.orcidimec | Sleeckx, Erik::0000-0003-2560-6132 | |
| dc.date.accessioned | 2021-10-14T17:17:13Z | |
| dc.date.available | 2021-10-14T17:17:13Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5455 | |
| dc.source.conference | KLA-Tencor Yield Management Seminar (YMS); April 25 2001; München, Germany. | |
| dc.source.conferencelocation | ||
| dc.title | In-line and nondestructive analysis of selectively grown epitaxial Si1-xGex and Si/Si1-xGex layers by spectroscopic ellipsometry and comparison with other established techniques | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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