Publication:
Selective growth of strained Ge on relaxed SiGe in shallow trench isolation for p-MOS FINFET
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1880 since deposited on 2021-10-22
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Acq. date: 2026-04-06
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1880 since deposited on 2021-10-22
1last month
1last week
Acq. date: 2026-04-06
Citations