Publication:

Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions

Date

2004
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dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorLisoni, Judit
dc.contributor.authorSchwitters, Michael
dc.contributor.authorMaes, David
dc.contributor.authorWouters, Dirk
dc.contributor.authorCasella, P.
dc.contributor.authorZambrano, R.
dc.contributor.authorVecchio, G.
dc.contributor.authorVan Autryve, Luc
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-15T15:18:28Z
dc.date.available2021-10-15T15:18:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9394
dc.source.conferenceE-MRS Spring Meeting Symposium D: Functional Oxides for Advanced Semiconductor Technologies
dc.source.conferencedate24/05/2004
dc.source.conferencelocationStrasbourg France
dc.title

Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions

dc.typeOral presentation
dspace.entity.typePublication
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