Publication:

The dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements

Date

1998
Journal article
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dc.contributor.authorWitvrouw, Ann
dc.contributor.authorMaex, Karen
dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorLekens, Geert
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDe Schepper, Luc
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.imecauthorLekens, Geert
dc.contributor.imecauthorD'Haen, Jan
dc.date.accessioned2021-10-01T09:48:45Z
dc.date.available2021-10-01T09:48:45Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3157
dc.source.beginpage1035
dc.source.endpage1041
dc.source.issue6_8
dc.source.journalMicroelectronics Reliability
dc.source.volume38
dc.title

The dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements

dc.typeJournal article
dspace.entity.typePublication
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