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Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence

Date

2001
Journal article
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dc.contributor.authorVereecke, Guy
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorKenis, Karine
dc.contributor.authorOnsia, Bart
dc.contributor.authorVerstraeten, K.
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.accessioned2021-10-14T18:17:51Z
dc.date.available2021-10-14T18:17:51Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5805
dc.source.beginpage2321
dc.source.endpage2330
dc.source.journalSpectrochimica Acta B
dc.source.volume56
dc.title

Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence

dc.typeJournal article
dspace.entity.typePublication
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