Publication:

LaSiOx- and Al2O3-Inserted Low-Temperature Gate-Stacks for Improved BTI Reliability in 3-D Sequential Integration

Date

2022
Journal article
https://doi.org/10.1109/TED.2022.3141983
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Author(s)

Wu, Zhicheng  
;
Franco, Jacopo  
;
Vandooren, Anne  
;
Arimura, Hiroaki  
;
Ragnarsson, Lars-Ake  
;
Roussel, Philippe  
;
Kaczer, Ben  
;
Linten, Dimitri  
;
Collaert, Nadine  
;
Groeseneken, Guido  

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES

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