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A 300mm CMOS-compatible PECVD silicon nitride platform for integrated photonics with low loss and low process induced phase variation
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2 since deposited on 2021-10-27
Acq. date: 2026-01-12
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Acq. date: 2026-01-11
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2 since deposited on 2021-10-27
Acq. date: 2026-01-12
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2001 since deposited on 2021-10-27
1last month
Acq. date: 2026-01-11
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