Publication:

A 300mm CMOS-compatible PECVD silicon nitride platform for integrated photonics with low loss and low process induced phase variation

Date

2019
Proceedings Paper
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dc.contributor.authorSeema Saseendran, Sandeep
dc.contributor.authorKongnyuy, Tangla David
dc.contributor.authorFigeys, Bruno
dc.contributor.authorMarinins, Aleksandrs
dc.contributor.authorJansen, Roelof
dc.contributor.authorRottenberg, Xavier
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorSoussan, Philippe
dc.contributor.imecauthorSeema Saseendran, Sandeep
dc.contributor.imecauthorKongnyuy, Tangla David
dc.contributor.imecauthorFigeys, Bruno
dc.contributor.imecauthorMarinins, Aleksandrs
dc.contributor.imecauthorJansen, Roelof
dc.contributor.imecauthorRottenberg, Xavier
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorSoussan, Philippe
dc.contributor.orcidimecSeema Saseendran, Sandeep::0000-0001-8556-0821
dc.contributor.orcidimecFigeys, Bruno::0000-0002-0108-3907
dc.contributor.orcidimecJansen, Roelof::0000-0001-6685-4699
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.date.accessioned2021-10-27T17:48:38Z
dc.date.available2021-10-27T17:48:38Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33959
dc.identifier.urlhttps://doi.org/10.1364/OFC.2019.M1C.4 https://ieeexplore.ieee.org/document/8696834
dc.source.beginpageM1C.4
dc.source.conferenceOptical Fiber Communication Conference 2019
dc.source.conferencedate3/03/2019
dc.source.conferencelocationSan Diego, CA USA
dc.title

A 300mm CMOS-compatible PECVD silicon nitride platform for integrated photonics with low loss and low process induced phase variation

dc.typeProceedings paper
dspace.entity.typePublication
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