Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Presentations
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Publication:
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Copy permalink
Date
2002
Presentation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hoffmann, Thomas
;
Storms, Greet
;
Vandenbroeck, Nadia
;
Delvaux, Christie
;
Ercken, Monique
;
Pollentier, Ivan
;
Ronse, Kurt
;
Takuji, Tada
;
Felten, Frank
;
Wong, Evelyn
Journal
Abstract
Description
Metrics
Views
2000
since deposited on 2021-10-14
6
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
2000
since deposited on 2021-10-14
6
last month
Acq. date: 2025-12-09
Citations