Publication:

Interim investigation of CD-SEM resist shrinkage in 193nm lithography

Date

2002
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Author(s)

Hoffmann, Thomas
;
Storms, Greet
;
Vandenbroeck, Nadia  
;
Delvaux, Christie  
;
Ercken, Monique  
;
Pollentier, Ivan  
;
Ronse, Kurt  
;
Takuji, Tada
;
Felten, Frank
;
Wong, Evelyn

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2009 since deposited on 2021-10-14
2last month
Acq. date: 2026-03-17

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