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Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Publication:
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Date
2002
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hoffmann, Thomas
;
Storms, Greet
;
Vandenbroeck, Nadia
;
Delvaux, Christie
;
Ercken, Monique
;
Pollentier, Ivan
;
Ronse, Kurt
;
Takuji, Tada
;
Felten, Frank
;
Wong, Evelyn
Journal
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Views
1992
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1992
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations