Publication:

Interim investigation of CD-SEM resist shrinkage in 193nm lithography

Date

2002
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dc.contributor.authorHoffmann, Thomas
dc.contributor.authorStorms, Greet
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorDelvaux, Christie
dc.contributor.authorErcken, Monique
dc.contributor.authorPollentier, Ivan
dc.contributor.authorRonse, Kurt
dc.contributor.authorTakuji, Tada
dc.contributor.authorFelten, Frank
dc.contributor.authorWong, Evelyn
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-14T21:48:58Z
dc.date.available2021-10-14T21:48:58Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6400
dc.source.conference3rd European Advanced Equipment Control / Advanced Process Control Conference
dc.source.conferencedate12/04/2002
dc.source.conferencelocationDresden Germany
dc.title

Interim investigation of CD-SEM resist shrinkage in 193nm lithography

dc.typeOral presentation
dspace.entity.typePublication
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