Publication:

Double patterning for 32-nm and below: an update

Date

2008
Proceedings Paper
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dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorVleeming, Bert
dc.contributor.authorHepp, Birgitt
dc.contributor.authorMegens, Henry
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorCheng, Shaunee
dc.contributor.authorVandeweyer, Tom
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorVandeweyer, Tom
dc.date.accessioned2021-10-17T07:06:20Z
dc.date.available2021-10-17T07:06:20Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13724
dc.source.beginpage692408
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Double patterning for 32-nm and below: an update

dc.typeProceedings paper
dspace.entity.typePublication
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