Publication:

New low-stress PECVD Poly-SiGe layers for MEMS

Date

2003
Journal article
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dc.contributor.authorRusu, Cristina
dc.contributor.authorSedky, S.
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorVerbist, Agnes
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorGeenen, Luc
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorLärmer, F.
dc.contributor.authorFischer, F.
dc.contributor.authorKronmüller, S.
dc.contributor.authorLeca, V.
dc.contributor.authorOtter, B.
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T06:28:47Z
dc.date.available2021-10-15T06:28:47Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8096
dc.source.beginpage816
dc.source.endpage825
dc.source.issue6
dc.source.journalJournal of Microelectromechanical Systems
dc.source.volume12
dc.title

New low-stress PECVD Poly-SiGe layers for MEMS

dc.typeJournal article
dspace.entity.typePublication
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