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High-k characterization by RFCV

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dc.contributor.authorSan Andres Serrano, Enrique
dc.contributor.authorPantisano, Luigi
dc.contributor.authorRoussel, Philippe
dc.contributor.authorToledano Luque, Maria
dc.contributor.authorTrojman, Lionel
dc.contributor.authorSeveri, Simone
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T19:22:11Z
dc.date.available2021-10-16T19:22:11Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12837
dc.source.beginpage363
dc.source.conferencePhysics and Technology of High-k Dielectrics
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
dc.source.endpage376
dc.title

High-k characterization by RFCV

dc.typeProceedings paper
dspace.entity.typePublication
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