Publication:

Atomic layer deposition of Gd-doped HfO2 thin films

Date

2010
Journal article
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorTielens, Hilde
dc.contributor.authorDewulf, Daan
dc.contributor.authorHardy, An
dc.contributor.authorPierreux, Dieter
dc.contributor.authorSwerts, Johan
dc.contributor.authorRosseel, Erik
dc.contributor.authorShi, Xiaoping
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-18T15:15:07Z
dc.date.available2021-10-18T15:15:07Z
dc.date.issued2010
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16628
dc.identifier.urlhttp://link.aip.org/link/?JES/157/G105
dc.source.beginpageG105
dc.source.endpageG110
dc.source.issue4
dc.source.journalJournal of the Electrochemical Society
dc.source.volume157
dc.title

Atomic layer deposition of Gd-doped HfO2 thin films

dc.typeJournal article
dspace.entity.typePublication
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