Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-technique
Publication:
Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-technique
Copy permalink
Date
2007-06
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
14099.pdf
1.44 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Puzzilli, G.
;
Govoreanu, Bogdan
;
Irrera, F.
;
Rosmeulen, Maarten
;
Van Houdt, Jan
Journal
Microelectronics Reliability
Abstract
Description
Metrics
Views
1853
since deposited on 2021-10-16
Acq. date: 2026-01-11
Citations
Metrics
Views
1853
since deposited on 2021-10-16
Acq. date: 2026-01-11
Citations