Publication:

Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-technique

Date

2007-06
Journal article
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dc.contributor.authorPuzzilli, G.
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorIrrera, F.
dc.contributor.authorRosmeulen, Maarten
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorRosmeulen, Maarten
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecRosmeulen, Maarten::0000-0002-3663-7439
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2021-10-16T18:50:39Z
dc.date.available2021-10-16T18:50:39Z
dc.date.embargo9999-12-31
dc.date.issued2007-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12744
dc.source.beginpage508
dc.source.endpage512
dc.source.issue4_5
dc.source.journalMicroelectronics Reliability
dc.source.volume47
dc.title

Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed CV-technique

dc.typeJournal article
dspace.entity.typePublication
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