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Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Publication:
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Date
2021
Journal article
https://doi.org/10.1016/j.mne.2021.100089
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Characterization_of_Ru4-xTax__x___1_2_3__alloy_as_material_candidate_for_EUV_low-n_mask
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Meiyi
;
de Marneffe, Jean-Francois
;
Opsomer, Karl
;
Detavernier, Christophe
;
Delabie, Annelies
;
Naujok, Philipp
;
Caner, Oezge
;
Goodyear, Andy
;
Cooke, Mike
;
Saadeh, Qais
;
Soltwisch, Victor
;
Scholze, Frank
;
Philipsen, Vicky
Journal
MICRO AND NANO ENGINEERING
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177
since deposited on 2022-03-04
62
item.page.metrics.field.last-week
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1936
since deposited on 2022-03-04
437
item.page.metrics.field.last-week
Acq. date: 2025-10-24
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