Publication:

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Date

2021
Journal article
https://doi.org/10.1016/j.mne.2021.100089
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dc.contributor.authorWu, Meiyi
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorDelabie, Annelies
dc.contributor.authorNaujok, Philipp
dc.contributor.authorCaner, Oezge
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorSaadeh, Qais
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorScholze, Frank
dc.contributor.authorPhilipsen, Vicky
dc.contributor.imecauthorWu, Meiyi
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaner, Oezge
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-03-04T13:37:59Z
dc.date.available2022-03-04T13:37:59Z
dc.date.embargo2023-05-07
dc.date.issued2021
dc.identifier.doi10.1016/j.mne.2021.100089
dc.identifier.issn2590-0072
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39307
dc.publisherELSEVIER
dc.source.beginpage100089
dc.source.issuena
dc.source.journalMICRO AND NANO ENGINEERING
dc.source.numberofpages9
dc.source.volume12
dc.title

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

dc.typeJournal article
dspace.entity.typePublication
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