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Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Publication:
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
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Date
2009
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Carbonell, Laure
;
Volders, Henny
;
Heylen, Nancy
;
Kellens, Kristof
;
Tokei, Zsolt
;
Hendrickx, Dirk
;
Struyf, Herbert
;
Claes, Martine
;
Versluijs, Janko
;
Van Besien, Els
;
Caluwaerts, Rudy
;
Cockburn, Andrew
;
Gravey, Virginie
;
Shah, Kavita
;
Al-Bayati, Amir
;
Fu, X.
;
Lubben, D.
;
Sundarrajan, A.
;
Beyer, Gerald
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1918
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Acq. date: 2025-12-11
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Views
1918
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-11
Citations