Publication:

Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures

Date

2009
Proceedings Paper
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dc.contributor.authorCarbonell, Laure
dc.contributor.authorVolders, Henny
dc.contributor.authorHeylen, Nancy
dc.contributor.authorKellens, Kristof
dc.contributor.authorTokei, Zsolt
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStruyf, Herbert
dc.contributor.authorClaes, Martine
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVan Besien, Els
dc.contributor.authorCaluwaerts, Rudy
dc.contributor.authorCockburn, Andrew
dc.contributor.authorGravey, Virginie
dc.contributor.authorShah, Kavita
dc.contributor.authorAl-Bayati, Amir
dc.contributor.authorFu, X.
dc.contributor.authorLubben, D.
dc.contributor.authorSundarrajan, A.
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorCaluwaerts, Rudy
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.date.accessioned2021-10-17T21:30:57Z
dc.date.available2021-10-17T21:30:57Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15064
dc.source.beginpage91
dc.source.conferenceAdvanced Metallization Conference 2008 (AMC2008)
dc.source.conferencedate23/09/2008
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage97
dc.title

Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures

dc.typeProceedings paper
dspace.entity.typePublication
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