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Articles
Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers
Publication:
Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers
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Date
1997
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baker, Daniel
;
Op de Beeck, Maaike
;
Botermans, Harry
;
Van den hove, Luc
Journal
Microelectronic Engineering
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since deposited on 2021-09-30
Acq. date: 2025-12-12
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1893
since deposited on 2021-09-30
Acq. date: 2025-12-11
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Downloads
1
since deposited on 2021-09-30
Acq. date: 2025-12-12
Views
1893
since deposited on 2021-09-30
Acq. date: 2025-12-11
Citations