Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers

dc.contributor.author	Baker, Daniel
dc.contributor.author	Op de Beeck, Maaike
dc.contributor.author	Botermans, Harry
dc.contributor.author	Van den hove, Luc
dc.contributor.imecauthor	Op de Beeck, Maaike
dc.contributor.imecauthor	Van den hove, Luc
dc.contributor.orcidimec	Op de Beeck, Maaike::0000-0002-2700-6432
dc.date.accessioned	2021-09-30T07:55:33Z
dc.date.available	2021-09-30T07:55:33Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1716
dc.source.beginpage	517
dc.source.endpage	522
dc.source.issue	1_4
dc.source.journal	Microelectronic Engineering
dc.source.volume	35
dc.title	Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers
dc.type	Journal article
dspace.entity.type	Publication
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